2024
Application of Plasma Information-Based Virtual Metrology (PI-VM) for Etching in C4F8/Ar/O2 Plasma
본문
- Author
- 김곤호
- Journal
- IEEE Transactions on Semiconductor Manufacturing
- Vol./ Page
- 37/4
- Year
- 2024
- All Authors
- Kim, G.[Kim, Gwanjoong]; Kwon, J.[Kwon, Ji-Won]; Lee, I.[Lee, Ingyu]; Seo, H.[Seo, Hwiwon]; Park, J.[Park, Jong-Bae]; Shin, J.[Shin, Jong-Hyun]; Kim, G.[Kim, Gon-Ho]
- P-ISSN
- 0894-6507
- DOI
- 10.1109/TSM.2024.3447074