2023 Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma 본문 Author 김곤호 Journal Current Applied Physics Vol./ Page Volume 45 Year 2023 DOI professor 수정 삭제 목록 이전글Geometry Extension and Assemblywise Domain Decomposition of nTRACER for Direct Whole-Core Calculation of VVERs 24.07.11 다음글Rotating spoke frequency in E x B penning source with two-ion-species plasma 24.07.11