2022 Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma 본문 Author 김곤호 Journal Journal of the Korean Physical Society Year 2022 DOI professor 수정 삭제 목록 이전글Design modifications to Rotating Modulation Collimators for extended field-of-view 22.04.22 다음글Safety evaluation of atmospheric pressure plasma jets in in vitro and in vivo experiments 22.04.22