Investigation of Plasma Distribution Dependency on Pattern Tilting in 300mm VHF-CCP Si Etch
본문
- 발명가
- 박태준, 이하늘, 손성현
- 등록/출원일
- 20210117
- 구분
- 대한민국
The 8th International Conference on Microelectronics and Plasma Technology and The 9th International Symposium on Functional Materials