Characteristics of Plasma density distribution in Focus ring region of VHF narrow gap CCP Etching reactor
본문
- 발명가
- 손성현, 이하늘
- 등록/출원일
- 20210117
- 구분
- 대한민국
The 8th International Conference on Microelectronics and Plasma Technology and The 9th International Symposium on Functional Materials